At Intellectual Property Law - Design from Tongji University the learning experience will be further enhanced and inspired by contributions from the College of Design and Innovation at Tongji University as well as by the involvement of specialized judges and practitioners experienced in the field. All the courses will be implemented in English language, in modular teaching and in way that close to practice. With the international, interdisciplinary and cooperative platform of the SICIP, the world-class researchers and experts in Intellectual Property will gather here to provide high-quality courses.
Graduates of the Program can work for domestic and foreign governments, judicial institutions or enterprises that having intellectual property business etc., especially the departments and international organizations engaging in foreign business in intectual property.
Get more detailsVisit official programme website
- Thesis writing and defense
- 30 months
Start dates & application deadlines
- Apply before , International
DisciplinesPatent & Intellectual Property Law Design Legal Studies View 33 other Masters in Design in China
We are not aware of any academic requirements for this programme.
- Minimum Bachelor’s degree from a recognized university (non-Chinese citizens);
- Proof of English proficiency (IELTS 6.5 or TOEFL 95 for non-Chinese citizens and CET-6 for Chinese citizens)
- 2 reference letters
- Curriculum Vitae
- Statement of purpose (max. one page)
- Self-introduction video material for admission
International10320 EUR/yearTuition FeeBased on the original amount of 10320 EUR per year and a duration of 30 months.
RMB 80,000 per Year
Studyportals Tip: Students can search online for independent or external scholarships that can help fund their studies. Check the scholarships to see whether you are eligible to apply. Many scholarships are either merit-based or needs-based.
Apply and win up to €10000 to cover your tuition fees.
Updated in the last 3 months
Check the official programme website for potential updates.